Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

US5346806A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Georg Pawlowski · Saitama, JP
• Ralph R. Dammel · Flemington, US
• Horst Roeschert · Ober-Hilbersheim, DE
• Walter Spiess · Dieburg, DE
• Charlotte Eckes · Mainz, DE

Key dates

• Filing date: Apr 20, 1992
• Grant date: Sep 13, 1994
• Expiry date: Apr 20, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/126
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical, PA1 R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--, PA1 R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group, PA1 X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O, PA1 Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6, PA1 R.sup.4 is an acyl radical, PA1 R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical, PA1 R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical, PA1 k is 0, 1, 2, 3 or 4, PA1 m is an integer greater than 1 and PA1 n is 1, 2 or 3, generate sulfonic acids under irradiation and are cleavable by the latter. In combination with alkali-soluble binders, they give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The re…