Method of measuring artifact taper
US5349434A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1993 |
| Grant date | Sep 20, 1994 |
| Priority date | — |
| Expiry date | Mar 24, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An interferometer (14) performs three topographical measures of an artifact (12) to determine taper between opposing surfaces (50 and 52) of the artifact (12) mounted on three points of support (30, 32, and 34). Two sets of three data points (60, 62, and 64 and 68, 70, and 72) are extracted from the first topographical measure and are used to calculate irregularities in one of the opposing surfaces (50). The second two topographical measures are made of the other artifact surface (52). Taper between the opposing surfaces (50 and 52) is calculated independently of both the surface irregularities and any angular deviations of the three points of support (30, 32, and 34).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.