Method for making a patterned resist substrate composite
US5362607A · kind A · utility
19Cited by
11References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 14, 1994 |
| Grant date | Nov 8, 1994 |
| Priority date | — |
| Expiry date | Feb 14, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for preparing a positive photoresist substrate composite is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.