Photolithography exposure tool and method for in situ photoresist measurments and exposure control
US5363171A · kind A · utility
43Cited by
8References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 29, 1993 |
| Grant date | Nov 8, 1994 |
| Priority date | — |
| Expiry date | Jul 29, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method is provided for measuring photoresist parameters in situ is disclosed. Transmission and reflectivity detectors are used in a lithographic exposure tool to obtain in situ absorption parameters and reflectivity data. The absorption parameters and reflectivity data are used in a feedback control system that controls the exposure dose used in the lithographic tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.