Uniaxial thin film structures formed from oriented bilayers and multilayers
US5363794A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1992 |
| Grant date | Nov 15, 1994 |
| Priority date | — |
| Expiry date | Dec 2, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/68
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing oriented, intermetallic, thin film structures having uniaxial magnetic, electronic, optical, and mechanical properties. Artificial superlattices (10) are assembled by sputter deposition of alternating layers of the component metals of the target intermetallic compound on an aligned substrate (16). Either single crystal substrates or crystallographically textured substrates may be used to induce alignment of the deposited layers (10, 12) in the method of the present invention. Annealing of the resulting superlattice (10) generates aligned, thin film intermetallic compounds (38) of the component metals at the interfaces (44) of the superlattice (10), the thin film intermetallic compounds having pronounced, uniaxial properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.