Etch method for manufacturing a color filter
US5364498A · kind A · utility
14Cited by
6References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 21, 1993 |
| Grant date | Nov 15, 1994 |
| Priority date | — |
| Expiry date | Jul 21, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/355
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A color filter is made by depositing a plurality of interference films on a substrate of black matrix material. The films are then selectively etched so that different numbers of films are removed at different locations. The color of the filter at a particular location depends on the number of films remaining at the location after etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.