Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
US5364734A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 1992 |
| Grant date | Nov 15, 1994 |
| Priority date | — |
| Expiry date | Jun 9, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/121
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive-working radiation-sensitive mixture is disclosed that contains PA1 (a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2, PA1 (b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and PA1 (c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions. The radiation-sensitive mixture is remarkable for its high resolution and high sensitivity over a wide spectral range. A radiation-sensitive recording material suitable for producing photoresists, electronic components or printing plates, or for chemical milli…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.