Patent · US Expired

Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

US5364734A · kind A · utility

17Cited by
5References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 1992
Grant dateNov 15, 1994
Priority date
Expiry dateJun 9, 2012

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/121
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A positive-working radiation-sensitive mixture is disclosed that contains PA1 (a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2, PA1 (b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and PA1 (c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions. The radiation-sensitive mixture is remarkable for its high resolution and high sensitivity over a wide spectral range. A radiation-sensitive recording material suitable for producing photoresists, electronic components or printing plates, or for chemical milli…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.