Projection exposure apparatus
US5365051A · kind A · utility
49Cited by
4References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1993 |
| Grant date | Nov 15, 1994 |
| Priority date | — |
| Expiry date | Jul 14, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus has a structure in which the deviation in a focusing direction between a portion on a wafer which a focus sensor detects during exposure and a desired portion in a shot area is detected, and an offset corresponding to the deviation detected is applied to the focus sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.