Positive photoresist having improved processing properties

US5369200A · kind A · utility

Assignees

• Ciba-Geigy · US
• OCG Microelectronics, Inc. · US

Inventors

• Ulrich Schadeli · Granges-Paccot, CH
• Norbert Munzel · Heitersheim, DE

Key dates

• Filing date: Dec 3, 1993
• Grant date: Nov 29, 1994
• Expiry date: Dec 3, 2013

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/039
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus, PA1 OR.sub.2 is an acid-cleavable radical, PA1 in which R.sub.2 is C.sub.4 -C.sub.10 tert-alkyl, allyl, cyclohex-2-enyl, C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, trialkylsilyl or a group of the formulae (IV)-(VII) ##STR3## in which R.sub.8 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, PA1 R.sub.3 and R.sub.4 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, PA1 R.sub.5 and R.sub.6 independently of one another are hydrogen or methyl, PA1 X is C.s…