Norbert Munzel
8Patents
8h-index
7Co-inventors
54Inventor score
Filing activity: Aug 15, 1992 → Mar 16, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5627011A | High resolution i-line photoresist of high sensitivity | Emerging Cross-Sectional Technologies | 26 | Expired |
| US5759740A | High resolution i-line photoresist of high sensitivity | Emerging Cross-Sectional Technologies | 15 | Expired |
| US5369200A | Positive photoresist having improved processing properties | Physics | 14 | Expired |
| US5296330A | Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive | Physics | 13 | Expired |
| US6638690B1 | Method for producing multi-layer circuits | Electricity | 13 | Expired |
| US5436098A | Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes | Physics | 9 | Expired |
| US5397680A | Positive photoresist having improved processing properties | Physics | 9 | Expired |
| US5650262A | High-resolution negative photoresist with wide process latitude | Emerging Cross-Sectional Technologies | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.