Frame-supported pellicle for protection of photolithographic mask
US5370951A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 22, 1993 |
| Grant date | Dec 6, 1994 |
| Priority date | — |
| Expiry date | Jan 22, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An improvement is proposed in a frame-supported pellicle, i.e. a thin transparent film of a polymeric resin adhesively bonded to a frame member, used for dust-proof protection of a photomask in a photolithographic patterning work for the manufacture of electronic devices. The improvement comprises using, as the adhesive, an organopolysiloxane-based composition which comprises (a) a perfluoroalkyl-containing diorganopolysiloxane having at least two vinyl groups per molecule, (b) an organohydrogenpolysiloxane having at least one epoxy group and (c) a platinum catalyst for promoting the hydrosilation reaction between (a) and (b). As compared with conventional adhesives, a quite good adhesive bonding strength can be obtained with this adhesive even when the membrane is made from a fluorocarbon group-containing polymeric resin and the adhesive layer obtained therefrom is highly resistant against ultraviolet irradiation to ensure a long serviceable life of the pellicle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.