Positive photoresist composition containing photoacid generator and use thereof
US5374500A · kind A · utility
24Cited by
10References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1993 |
| Grant date | Dec 20, 1994 |
| Priority date | — |
| Expiry date | Apr 2, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.