Resist materials and processes of their use
US5374504A · kind A · utility
3Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 1993 |
| Grant date | Dec 20, 1994 |
| Priority date | — |
| Expiry date | May 11, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Resist materials sensitive to actinic radiation are formed from an acid generator and a material sensitive to acid. The acid from the acid generator interacts with the acid sensitive material to produce a change in solubility. Particularly useful acid generators included benzyl and naphthylmethyl sulfones.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.