Control apparatus and method for a substrate tray on an in-line sputtering apparatus
US5376777A · kind A · utility
2Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1991 |
| Grant date | Dec 27, 1994 |
| Priority date | — |
| Expiry date | Nov 21, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG07C3/04
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The number of times a substrate tray has been used and the amount of distortion of the substrate tray are measured. When the number of times of use or the distortion amount of the substrate tray exceed a predetermined value, respectively, the substrate tray is exchanged automatically.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.