Eiji Setoyama
13Patents
10h-index
22Co-inventors
68Inventor score
Filing activity: Sep 25, 1986 → Dec 1, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6084356A | Plasma processing apparatus with a dielectric body in the waveguide | Electricity | 59 | Expired |
| US5116482A | Film forming system using high frequency power and power supply unit for the same | Electricity | 58 | Expired |
| US6196155A | Plasma processing apparatus and method of cleaning the apparatus | Electricity | 46 | Expired |
| US4865709A | Magnetron sputter apparatus and method for forming films by using the same apparatus | Electricity | 28 | Expired |
| US4673482A | Sputtering apparatus | Electricity | 25 | Expired |
| US4986890A | Thin film deposition system | Electricity | 22 | Expired |
| US5429729A | Sputtering apparatus, device for exchanging target and method for the same | Chemistry; Metallurgy | 16 | Expired |
| US6224676A | Gas supply apparatus and film forming apparatus | Electricity | 14 | Expired |
| US5085755A | Sputtering apparatus for forming thin films | Chemistry; Metallurgy | 11 | Expired |
| US4911815A | Sputtering apparatus for production of thin films of magnetic materials | Chemistry; Metallurgy | 10 | Expired |
| US5783055A | Multi-chamber sputtering apparatus | Electricity | 10 | Expired |
| US5061356A | Vacuum treatment apparatus and vacuum treatment method | Chemistry; Metallurgy | 4 | Expired |
| US5376777A | Control apparatus and method for a substrate tray on an in-line sputtering apparatus | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.