Secondary ion mass spectometry system
US5376791A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1993 |
| Grant date | Dec 27, 1994 |
| Priority date | — |
| Expiry date | Feb 22, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/006
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A focused ion beam is directed toward a sample to be analyzed while iodine vapor is directed toward the sample. The iodine vapor, which is formed by heating solid iodine to a temperature of 30.degree. C. to 50.degree. C., aids in sputtering of material impinged by the ion beam and in enhancing the conversion of neutral to ionic sputtered species. A quadrupole mass analyzer is positioned for receiving secondary ions sputtered from the sample whereby chemical analysis is accomplished. The iodine may be initially handled in a solid state, exhibiting a low vapor pressure, and is then heated to moderate temperatures inside a focused ion beam system without presenting a toxic hazard or requiring external plumbing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.