FEI Company
799Patents
706Active
799Granted
62Portfolio score
Filing activity: Apr 4, 1974 → May 15, 2024 · 119 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6753538B2 | Electron beam processing | Electricity | 95 | Expired |
| US5435850A | Gas injection system | Electricity | 95 | Expired |
| US5188705A | Method of semiconductor device manufacture | Electricity | 88 | Expired |
| US6211527A | Method for device editing | Electricity | 78 | Expired |
| US6268608A | Method and apparatus for selective in-situ etching of inter dielectric layers | Electricity | 67 | Expired |
| US6414307B1 | Method and apparatus for enhancing yield of secondary ions | Emerging Cross-Sectional Technologies | 65 | Expired |
| US6399944B1 | Measurement of film thickness by inelastic electron scattering | Physics | 59 | Expired |
| US7241361B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 55 | Expired |
| US5827786A | Charged particle deposition of electrically insulating films | Electricity | 53 | Expired |
| US6900447B2 | Focused ion beam system with coaxial scanning electron microscope | Electricity | 53 | Expired |
| US6889113B2 | Graphical automated machine control and metrology | Emerging Cross-Sectional Technologies | 52 | Expired |
| US7670455B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 43 | Active |
| US6457350B1 | Carbon nanotube probe tip grown on a small probe | Emerging Cross-Sectional Technologies | 41 | Expired |
| US5541411A | Image-to-image registration focused ion beam system | Electricity | 40 | Expired |
| US6504151B1 | Wear coating applied to an atomic force probe tip | Emerging Cross-Sectional Technologies | 39 | Expired |
| US6963068B2 | Method for the manufacture and transmissive irradiation of a sample, and particle-optical system | Electricity | 37 | Expired |
| US6373070B1 | Method apparatus for a coaxial optical microscope with focused ion beam | Electricity | 36 | Expired |
| US7423263B2 | Planar view sample preparation | Electricity | 36 | Active |
| US7348556B2 | Method of measuring three-dimensional surface roughness of a structure | Physics | 35 | Active |
| US6497194B1 | Focused particle beam systems and methods using a tilt column | Electricity | 35 | Expired |
| US5376791A | Secondary ion mass spectometry system | Electricity | 34 | Expired |
| US8076650B2 | Multi-source plasma focused ion beam system | Electricity | 33 | Active |
| USD657474S1 | Sample carrier | General | 30 | Expired |
| US8168957B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 30 | Active |
| US7504182B2 | Photolithography mask repair | Physics | 29 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.