Frame-supported pellicle for photolithography
US5378514A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1993 |
| Grant date | Jan 3, 1995 |
| Priority date | — |
| Expiry date | Aug 6, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is a novel frame-supported pellicle for dust-proof protection of a photomask used in the photolithographic patterning work in the manufacture of semiconductor devices and the like. The frame-supported pellicle of the invention consists of a pellicle membrane made from a specific fluorocarbon-containing polymer which is adhesively bonded in a slack-free fashion to a surface of a rigid pellicle frame by means of a hot-melt adhesive which is a fluorocarbon-containing polymer of the same type as or similar to the fluorocarbon-containing polymer of the membrane so that no problems are involved in the adhesive bonding relative to the compatibility between the adhesive and the membrane which otherwise is poorly susceptible to adhesive bonding.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.