Mid and deep-UV antireflection coatings and methods for use thereof
US5380621A · kind A · utility
37Cited by
13References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 1993 |
| Grant date | Jan 10, 1995 |
| Priority date | — |
| Expiry date | May 3, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/904
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.