Laser pattern generation apparatus
US5386221A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1992 |
| Grant date | Jan 31, 1995 |
| Priority date | — |
| Expiry date | Nov 2, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/04794
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam is split into 32 beams to create a brush. The brush scans the workpiece through use of a rotating polygonal mirror. Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator. Signals provided to the Acousto-Optical Modulator define the pattern to be generated. These signals are created by a rasterizer. Increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.