Exposure calculating apparatus
US5392091A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 24, 1992 |
| Grant date | Feb 21, 1995 |
| Priority date | — |
| Expiry date | Aug 24, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B2213/025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure calculating apparatus includes a light-metering device, consisting of a light-metering elements corresponding to elementary areas obtained by dividing a field of a focusing optical system, for measuring a light intensity distribution in the field, a position of object detecting means for detecting a position of object in the field, a classifying means for changing a divisional pattern of light-metering areas in correspondence with the position of object, and classifying the light-metering elements of the light-metering device into a plurality of groups according to the divisional pattern, and a calculating device for calculating an exposure value by weighting the outputs from the plurality of light-metering elements in correspondence with the groups to which the light-metering elements belong, and supplying the exposure value to exposure control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.