Patent · US Expired

Apparatus for coating a substrate by magnetron sputtering

US5399252A · kind A · utility

22Cited by

13References

10Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Michael Scherer · Crimmitschau, DE
Wolfram Maass · Gelnhausen, DE
Joachim Szczyrbowski · Goldbach, DE

Key dates

Filing date	Nov 8, 1993
Grant date	Mar 21, 1995
Priority date	—
Expiry date	Nov 8, 2013

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3405
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A pair of magnetron cathodes in an evacuable coating chamber are connected to the outputs of the secondary winding of a transformer, the primary winding being connected to the outputs of a medium frequency A.C. generator. An oval target is mounted on each cathode and surrounded by stainless steel bars. As an alternative the bars may be configured as plates connected to ground and mounted to the target by insulating spacers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.