Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

US5401608A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Georg Pawlowski · Saitama, JP
• Ralph R. Dammel · Flemington, US
• Horst Roeschert · Ober-Hilbersheim, DE
• Winfried Meier · Frankfurt am Main, DE
• Walter Spiess · Dieburg, DE
• Klaus-Juergen Przybilla · Frankfurt, DE

Key dates

• Filing date: Jul 23, 1992
• Grant date: Mar 28, 1995
• Expiry date: Jul 23, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/124
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A negative-working radiation-sensitive mixture containing PA0 a) a compound which contains at least one --CBr.sub.3 group bound to an atom not linked in turn to a hydrogen atom, PA0 b) an alkoxymethylated melamine and PA0 c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups, wherein PA0 (1) the mixture has an absorption of <0.4 .mu.m.sup.-1 at 248 nm, PA0 (2) the CBr.sub.3 group of the compound a) is bound to the sulfur atom of a sulfonyl group and the compound a) is contained in the mixture in an amount of 0.2 to 10% by weight, based on the total amount of the components b) and c), PA0 (3) the ratio by mass of the components b) and c) is between 50:50 and 5:95 and PA0 (4) the component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, the homopolymer or copolymer having a removal rate of 200 to 3,000 nm/min at 21.degree. C. in an aqueous alkaline developer containing 2.38% by weight of tetramethylammonium hydroxide, has excellent properties including high resistance to plasma etching, and outstanding lithographic properties and is useful in recording materials.