Projection exposure method and apparatus with focus detection
US5412214A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 1993 |
| Grant date | May 2, 1995 |
| Priority date | — |
| Expiry date | Jul 7, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure method and apparatus are disclosed, which can perform a focusing operation with respect to a partly omitted shot exposed at a peripheral portion of a photosensitive substrate such as a wafer. In the projection exposure method and apparatus, when a prohibition band having a predetermined width is set from the edge of the substrate, and exposure is to be performed with respect to a shot area having a portion located only within the prohibition band and the remaining portion located outside the edge of the substrate, a focus detection point is shifted to the boundary line of the prohibition band on the substrate, and a focusing operation is performed. Thereafter, the focus detection point is moved to an original target shot exposure position to perform exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.