Patent · US Expired

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters

US5413899A · kind A · utility

2Cited by
7References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 6, 1994
Grant dateMay 9, 1995
Priority date
Expiry dateJun 6, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/022
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical and PA1 R.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical, and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.