Interference removal
US5414504A · kind A · utility
9Cited by
1References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 1993 |
| Grant date | May 9, 1995 |
| Priority date | — |
| Expiry date | Feb 19, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32963
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of microelectronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.