Surface scanner with thin film gauge
US5416594A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 1993 |
| Grant date | May 16, 1995 |
| Priority date | — |
| Expiry date | Jul 20, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical surface scanner for semiconductor wafers and like substrates having one channel with a detector receiving collected scattered light and another channel with a detector receiving reflected light. The scattered light signal is indicative of surface haze, particle count and size, while the reflected light signals are indicative of film thickness and/or surface properties as in the case of an opaque or absorbing layer. The latter signal may be used to correct the particle count and size determination and may also be used simultaneously for thin film measurement. The reflectivity or thin film measurement signals may be used to characterize a film layer controller to improve the accuracy of the deposited thickness of the layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.