Sputtering apparatus having a rotating magnet array and fixed electromagnets
US5417833A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 1993 |
| Grant date | May 23, 1995 |
| Priority date | — |
| Expiry date | Apr 14, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3458
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetron sputter apparatus is disclosed which includes a rotatable generally heart-shaped, closed-loop magnet array behind the target and in front of a pair of separately driven stationary electromagnets. The apparatus is optimized to produce a sputtered film on a planar substrate having desired film characteristics such as uniformity of thickness, good step coverage, and good via filling and efficient utilization of the target. The shape of the generally heart-shaped array includes a flattened tip forming an arc of a circle centered on the axis of rotation and concave cusps in the lobes of the heart-shape. The electromagnets are used to increase target utilization at its center and to compensate for the change in shape of the target and distance from the target to the substrate with depletion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.