David J. Harra
15Patents
10h-index
16Co-inventors
69Inventor score
Filing activity: Jul 18, 1980 → Nov 18, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4512391A | Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet | Chemistry; Metallurgy | 118 | Expired |
| US4714536A | Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields | Electricity | 82 | Expired |
| US4303251A | Flange sealing joint with removable metal gasket | Mechanical Engineering; Lighting; Heating | 43 | Expired |
| US5314597A | Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile | Electricity | 38 | Expired |
| US5985115A | Internally cooled target assembly for magnetron sputtering | Electricity | 29 | Expired |
| US5417833A | Sputtering apparatus having a rotating magnet array and fixed electromagnets | Electricity | 25 | Expired |
| US4416759A | Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers | Chemistry; Metallurgy | 23 | Expired |
| US4392932A | Method for obtaining uniform etch by modulating bias on extension member around radio frequency etch table | Electricity | 19 | Expired |
| US4436602A | Blocking shield and method for contouring the thickness of sputter coated layers | Chemistry; Metallurgy | 16 | Expired |
| US8259299B2 | Gas scanning and analysis | Human Necessities | 13 | Active |
| US4392938A | Radio frequency etch table with biased extension member | Electricity | 5 | Expired |
| US8382668B2 | Non-invasive determination of characteristics of a sample | Human Necessities | 4 | Active |
| US10264993B2 | Sample scanning and analysis system and methods for using the same | Physics | 1 | Active |
| US8647272B2 | Non-invasive scanning apparatuses | Human Necessities | 0 | Active |
| US8647273B2 | Non-invasive weight and performance management | Human Necessities | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.