Frame-supported pellicle for dustproof protection of photomask
US5419972A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 9, 1994 |
| Grant date | May 30, 1995 |
| Priority date | — |
| Expiry date | Aug 9, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12764
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.