Micropattern forming method
US5422205A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1994 |
| Grant date | Jun 6, 1995 |
| Priority date | — |
| Expiry date | Mar 2, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of transferring a micropattern onto a substrate includes the step of forming a multilayer film consisting of at least two layers on the substrate, the first exposing step of exposing the uppermost layer of the multilayer film through a first mask having a pattern equal to or larger than the micropattern, the step of positioning a second mask such that a main pattern thereof overlaps a transfer area of the uppermost layer of the multilayer film, the second mask having the main pattern corresponding to the micropattern and an auxiliary pattern arranged in the vicinity of the main pattern, and the second exposing step of exposing a layer other than the uppermost layer of the multilayer film through the second mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.