Scanning electron beam device

US5422486A · kind A · utility

Assignee

• ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · DE

Inventors

• Karl Herrmann · Lenzkirch, DE
• Steffen Beck · Heimstetten, DE
• Hans-Peter Feuerbaum · Hersbruck, DE
• Jürgen Frosien · Riemerling, DE
• Andreas Benez · Sindelfingen, DE
• Stefan Lanio · Erding, DE
• Gerold Schonecker · Munich, DE

Key dates

• Filing date: May 7, 1993
• Grant date: Jun 6, 1995
• Expiry date: May 7, 2013

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/151
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The invention relates to a scanning electron beam device in which at least one electrostatic reflector is provided for reflection of a secondary electron beam emitted by the primary electron beam on the object. This reflector is preferably located outside the beam path of the primary electron beam, and at least one electron-optical element which effects a preliminary deflection of the secondary electron beam by a small angle with respect to the beam path of the primary electron beam is provided between the object and the reflector. Such an arrangement makes it possible with comparatively low technical expenditure to reflect the secondary electron beam by a relatively large angle with respect to the unaffected primary electron beam which travels on a straight axis.