Continuous vapor deposition apparatus
US5424097A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1993 |
| Grant date | Jun 13, 1995 |
| Priority date | — |
| Expiry date | Sep 30, 2013 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Continuous vapor deposition apparatus for coating objects with a coating material, e.g., parylene, are disclosed. The apparatus comprise an entrance chamber for loading the objects, a process chamber for coating the objects, and an exit chamber for removing the objects. Coating material is introduced into the process chamber under vacuum conditions in a vaporized state. The pressure in the process chamber can be controlled by modulating the rate of introduction of the coating material with a modulating valve in response to the pressure in the process chamber. A process for continuously coating objects by vapor deposition under vacuum conditions, suitable for use in the apparatus, is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.