Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom

US5424166A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Georg Pawlowski · Saitama, JP
• Ralph R. Dammel · Flemington, US
• Horst Roeschert · Ober-Hilbersheim, DE
• Walter Spiess · Dieburg, DE
• Winfried Meier · Frankfurt am Main, DE

Key dates

• Filing date: Feb 4, 1994
• Grant date: Jun 13, 1995
• Expiry date: Feb 4, 2014

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/038
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A negative-working radiation-sensitive mixture which comprises PA1 a) a compound, which forms a strong acid on irradiation, of the general formula ##STR1## in which R.sup.1 is a radical R.sup.2 --SO.sub.2 -- or R.sup.3 --C(O)-- and PA2 R.sup.2 and R.sup.3 independently of one another are an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, PA1 b) a compound containing at least two reactive groups which can be crosslinked by an acid and PA1 c) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions, is described. The radiation-sensitive mixture according to the invention is distinguished by a high sensitivity over a wide spectral range. It likewise exhibits a high heat stability and forms no corrosive photolysis products on exposure to light.