Apparatus and a method for dynamically tuning a particle sensor in response to varying process conditions
US5424558A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 1993 |
| Grant date | Jun 13, 1995 |
| Priority date | — |
| Expiry date | May 17, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03G5/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and an apparatus allow dynamic tuning of a particle sensor. The particle sensor provides output signals indicating particle detection to a controller, which includes an amplifier whose bandwidth and gain can be adjusted. The bandwidth and the gain of the amplifier are adjusted in accordance with predetermined optimal performance levels under the varying process conditions in which the particle sensor is placed. The optimal signal-to-noise ratio is maintained by adjusting the bandwidth and the gain according to both expected particle velocities and whether a plasma glow is present in the exhaust line for carrying gasses out of a process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.