Thin film DC plasma processing system
US5427669A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 30, 1992 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Dec 30, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.