Thermal control line for delivering liquid to a point of use in a photolithography system
US5427820A · kind A · utility
19Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1993 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Jul 16, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method for dispensing liquid at a controlled temperature in a spin coating or developer machine are disclosed. The apparatus is a thermal control line that has an inner core wall that encloses at least one conduit for a liquid dispense line and an outer annular wall that encloses at least one chamber for circulation of coolant. The inner core wall and the outer annular wall are formed of such materials as to permit efficient heat exchange between the coolant and the liquid. The coolant is circulated in the annular chamber at a rate sufficient to maintain the dispensed liquid at a desired temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.