Patent · US Expired

Apparatus for coating and/or etching substrates in a vacuum chamber

US5429705A · kind A · utility

2Cited by

10References

14Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Peter Mahler · Obertshausen, DE
Wolfgang Stang · Kefenrod, DE

Key dates

Filing date	Dec 1, 1993
Grant date	Jul 4, 1995
Priority date	—
Expiry date	Dec 1, 2013

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/34
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatus for the coating and etching of substrates in a vacuum chamber (4), includes a cathode (17, 17') having a target (18, 18'), and a rotatable structure (8) shaped as an essentially cylindrical hollow body having circular disk-shaped end faces provided with pivot shafts (10, 10') held for rotation about a horizontal axis (r) in bearings (11, 11') disposed on the side walls (12, 12') of the vacuum chamber (4). Mountings (19, 19') for holding the substrates in place are provided on the circumference of the hollow body, the cathode (17, 17') and the etching anode (16) being disposed opposite the rotatable structure (8) in a plane (E) running horizontally and approximately in the plane of the axis of rotation (r).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.