Method for adhering diamondlike carbon to a substrate
US5431963A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1994 |
| Grant date | Jul 11, 1995 |
| Priority date | — |
| Expiry date | Mar 18, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S427/103
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The electrical field at the surface of an electrode is graded by depositing a semiconductive coating thereon. An electrode substrate is powered at a preselected temperature and power. A mixture of gases is then passed through an electrical discharge to ionize at least a portion thereof to form the semiconductive coating on the surface of the electrode. A diamondlike carbon (DLC) film is deposited by plasma enhanced chemical vapor deposition onto a substrate. A substrate is maintained at a preselected DLC forming temperature and is negatively biased at a first preselected voltage. A first gaseous mixture of hydrocarbons and argon is then passed through an electrical discharge to at least partially ionize the hydrocarbons to form DLC film on the substrate. The substrate is then negatively biased at a second preselected voltage lower than the first preselected voltage. A second gaseous mixture of hydrocarbons and argon or hydrogen is then passed through the electrical discharge to at least partially ionize the hydrocarbons to form additional DLC film on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.