Proximity exposure method and machine therefor
US5434648A · kind A · utility
6Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1994 |
| Grant date | Jul 18, 1995 |
| Priority date | — |
| Expiry date | Feb 10, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A proximity exposure method and apparatus therefor. Replications of mask patterns are carried out, wherein as a mask closely approaches a substrate, the displacement of the mask is detected, and the atmospheric pressure between the mask and the substrate, or around the side of the mask opposite the substrate is controlled so as to cancel the displacement of the mask. The apparatus includes positioning apparatus, a light source for exposing the mask pattern, displacement measuring means, and atmospheric pressure controlling means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.