Chemical processing system for maintaining concentration of semiconductor processing solution
US5437710A · kind A · utility
7Cited by
10References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 1994 |
| Grant date | Aug 1, 1995 |
| Priority date | — |
| Expiry date | Dec 14, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A chemical processing system for generating ultra-pure chemicals near the site of use. The system includes in series a supply of chemical or the site of use which may be a tank or drum and may be a point of use for semiconductor manufacturing, a concentrate sensor, a pump, a filter, a reactor vessel, and an optional heat exchanger, all connected by Kel-F tubing. Sources of pure filtered gas connect to the reactor vessel. An ozone generator can likewise connect to the reactor vessel. An optional isolation coil can likewise connect between the gas source and the reactor vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.