Plasma polymer antireflective coating
US5443941A · kind A · utility
29Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 1, 1993 |
| Grant date | Aug 22, 1995 |
| Priority date | — |
| Expiry date | Mar 1, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/427
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective coating used in the photolithography process is applied and removed in a plasma reactor. The halocarbon plasma polymer such as fluorocarbon plasma polymer of the present invention provides an improved antireflective coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.