Satyendra Sethi
14Patents
7h-index
14Co-inventors
55Inventor score
Filing activity: Mar 1, 1993 → Jun 5, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6297170A | Sacrificial multilayer anti-reflective coating for mos gate formation | Electricity | 205 | Expired |
| US5883011A | Method of removing an inorganic antireflective coating from a semiconductor substrate | Physics | 77 | Expired |
| US5776821A | Method for forming a reduced width gate electrode | Electricity | 69 | Expired |
| US5443941A | Plasma polymer antireflective coating | Physics | 29 | Expired |
| US5952135A | Method for alignment using multiple wavelengths of light | Physics | 12 | Expired |
| US5852497A | Method and apparatus for detecting edges under an opaque layer | Physics | 11 | Expired |
| US6313542A | Method and apparatus for detecting edges under an opaque layer | Physics | 7 | Expired |
| US6215129A | Via alignment, etch completion, and critical dimension measurement method and structure | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6411367B1 | Modified optics for imaging of lens limited subresolution features | Physics | 7 | Expired |
| US6262795A | Apparatus and method for the improvement of illumination uniformity in photolithographic systems | Physics | 6 | Expired |
| US6433854B1 | Method of illumination uniformity in photolithographic systems | Physics | 4 | Expired |
| US6372522B1 | Use of optimized film stacks for increasing absorption for laser repair of fuse links | Electricity | 3 | Expired |
| US6642529B1 | Methods for the automated testing of reticle feature geometries | Physics | 3 | Expired |
| US6162650A | Via alignment, etch completion, and critical dimension measurement method and structure | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.