Semiconductor random access memory cell on silicon-on-insulator with dual control gates
US5446299A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1994 |
| Grant date | Aug 29, 1995 |
| Priority date | — |
| Expiry date | Apr 29, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/201
Abstract
A stacked gate memory cell for a memory cell array is disclosed that is constructed on a SOI substrate and contains a second control gate buried underneath the conducting channel of the cell in addition to a first wordline control gate that is disposed over a floating gate changing the voltage on the second control gate will modulate the potential of the floating channel, which allows a specific cell of the array to be selected and the programmed or erased by FN tunneling through the floating gate and channel without disturbing adjacent cells. While reading the information stored in the floating gate, the second control gate can also be used to prevent disturb. The second control gate is in parallel with the bit line and perpendicular with the first word line control gate. The floating gate and the cell is located at the cross point of the first and second control gates. Therefore, by varying the voltage on the first and second control gates only, the cell can be programmed or erased through FN tunneling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.