Wide-field exposure optical system
US5448416A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 3, 1993 |
| Grant date | Sep 5, 1995 |
| Priority date | — |
| Expiry date | Mar 3, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B17/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A wide-field exposure optical system in which the projection is performed by scanning an object to be projected with a predetermined scan width. The optical system comprises an illuminating section for illuminating the object to be projected in a circular arc region, a reflecting and refracting optical system for correcting the aberration of a circular arc region having its center on the optical axis and for forming, within an image surface, an image of the object to be projected illuminated by the illuminating section as a circular arc, a driving means for moving light-receiving members arranged on the object to be projected and on the image surface relative to the illuminating section and the reflecting and refracting optical system, and the reflecting and refracting optical system being formed by a first lens group, a second lens group and one concave mirror. The second lens group comprises a second lens which is a convex lens and a third lens which is a concave lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.