Hisakazu Yoshino
20Patents
10h-index
26Co-inventors
71Inventor score
Filing activity: Dec 10, 1980 → Nov 2, 1998
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6104481A | Surface inspection apparatus | Physics | 58 | Expired |
| US6084716A | Optical substrate inspection apparatus | Physics | 48 | Expired |
| US4711541A | Slit lamp and accessory device thereof | Human Necessities | 41 | Expired |
| US4711540A | Eye disease inspecting instrument | Human Necessities | 35 | Expired |
| US4632528A | Method for determining refractive index of an object | Human Necessities | 27 | Expired |
| US4902133A | Method and an apparatus for aligning first and second objects with each other | Physics | 18 | Expired |
| US4702570A | Stereo-microscope with two observation optical systems each including a right angle prism and a roof right angle prism providing both rotation and relative separation adjustments | Physics | 14 | Expired |
| US4984890A | Method and an apparatus for aligning first and second objects with each other | Physics | 12 | Expired |
| US5673135A | Scanning projection optical device | Physics | 11 | Expired |
| US4601550A | Stereo-microscope with a common objective lens system | Physics | 11 | Expired |
| US5828457A | Sample inspection apparatus and sample inspection method | Physics | 8 | Expired |
| US4571842A | Lens judging apparatus of lens meter | Physics | 8 | Expired |
| US5369521A | Scanning type projector | Physics | 6 | Expired |
| US5812259A | Method and apparatus for inspecting slight defects in a photomask pattern | Physics | 5 | Expired |
| US5298096A | Method of producing a lens | Emerging Cross-Sectional Technologies | 5 | Expired |
| US4597650A | Specular microscope | Human Necessities | 4 | Expired |
| US4808002A | Method and device for aligning first and second objects relative to each other | Physics | 4 | Expired |
| US4564291A | Projection type lensmeter | Physics | 4 | Expired |
| US6100970A | Apparatus for inspecting slight defects on a photomask pattern | Physics | 3 | Expired |
| US5448416A | Wide-field exposure optical system | Physics | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.