Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber
US5451258A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 1994 |
| Grant date | Sep 19, 1995 |
| Priority date | — |
| Expiry date | May 11, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4485
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Gas delivery apparatuses and methods utilize a housing containing three thermal zones through which a gas travels from a source to a reaction chamber. Reactant gases vaporized within the first thermal zone travel in a line through the succeeding thermal zones. In each successive thermal zone, the gas is heated at a higher temperature to prevent condensation within the line. The gas line is heated in the thermal zones by mounting in-line components to heater plates which are controlled to heat the in-line components at the temperatures associated with the thermal zone. The third thermal zone is heated at a substantially higher temperature than the first and second thermal zones in order to prevent formation of an adduct within the gas line. In one embodiment, the gas line extends into the reaction chamber through a heater block which uniformly heats the gas line at a temperature higher than temperatures of the thermal zones to further prevent condensation and prevent the formation of an adduct. In an alternative embodiment, a gas passage is integrally formed within the sidewall and cover of the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.