Artical fabrication utilizing lithographic processes
US5451480A · kind A · utility
2Cited by
3References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 12, 1994 |
| Grant date | Sep 19, 1995 |
| Priority date | — |
| Expiry date | Aug 12, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A procedure for producing an article such as an integrated circuit or a lithographic mask including the step of exposing and developing a resist material during a lithographic process is substantially improved by utilizing a specific technique. In particular, a prototypical plot is made based on typical conditions. Thereafter, this calibration is employable for developing the resist material even at substantially different environmental and processing conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.