Protective mask for pellicle
US5453816A · kind A · utility
19Cited by
15References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 22, 1994 |
| Grant date | Sep 26, 1995 |
| Priority date | — |
| Expiry date | Sep 22, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A protective mask is provided for use with a pellicle which is mounted to a photomask during photolithography, with a light source being directed toward the photomask. The pellicle includes a pellicle membrane mounted to a pellicle frame by a first adhesive layer and with the pellicle frame being mounted to the photomask by a second adhesive layer. The protective mask is fabricated of an opaque material and is positioned between the light source and the two adhesive layers to shield them from the light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.