SOG coated apparatus to solve SOG non-uniformity in the VLSI process
US5454871A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 1, 1994 |
| Grant date | Oct 3, 1995 |
| Priority date | — |
| Expiry date | Dec 1, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions is described, The apparatus comprises a treatment chamber. Within the treatment chamber are a spin-on-glass coater spin table, a plurality of hotplates connected to one another and from the coater spin table by a moving belt, and wafer handlers to transfer wafers onto the coater spin table and onto the moving belt. A dehumidifier is disposed on top of the treatment chamber and a humidity control unit is disposed on top of the dehumidifier through which air is drawn and whereby relative humidity within the treatment chamber can be controlled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.